A Brooks vaporizer system provides 100% vaporization and repeatable, uniform, particle-free films. It can mix up to three fluid streams and is the only system robust enough to handle low vapor pressure and thermally sensitive fluids. With a dynamic flow range of less than 10 grams/hr to greater than 10 kg/hr and Coriolis-based mass flow control, this system is truly unique.
 Our reliable, modern vaporization solutions are superior to flash vaporizers and bubbler (vapor draw) systems and have been proven in many applications such as chemical vapor deposition (CVD), metal organic chemical vapor deposition (MOCVD), advanced material deposition in the semiconductor industry, vaporizing monomers for vacuum polymer film deposition, creating thin films for enhanced thermal, optical, or hardness characteristics (e.g. Diamond-like coatings), generating calibration vapor for continuous emission monitoring systems, and more.
Let Brooks help you estimate the economic benefits of replacing an inefficient bubbler or flash vaporizer system. The results will be compelling.
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